Published Work
Eight peer-reviewed works on resistive memory, in-memory logic, crossbar arrays, and 2-D material transistors — written between IIT Ropar, the University of Michigan, and collaborations abroad.
67 Citations · h-index 3 · i10-index 2 — live metrics on Google Scholar
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01
RRAM · In-Memory Logic First Author
Performance Investigation of HfOx-Based 1-Transistor–1-Memristor Cell for In-Memory Logic Gates ImplementationA. K. Gupta, M. S. Yadav, B. Rawat
Investigates how a 1-transistor–1-memristor cell built on HfOx performs when logic gates are implemented directly inside memory — a step toward computing where the data already lives.
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02
RRAM · Neuromorphic
Unveiling the Role of Nanoscale-Thick Thermal Enhancement Layers in Tuning Analog Switching and Synaptic Plasticity of MemristorM. S. Yadav, A. K. Gupta, B. Rawat
Studies how nanoscale-thick thermal enhancement layers tune a memristor's analog switching behavior and synaptic plasticity — connecting device-level thermal engineering to neuromorphic function.
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03
RRAM · Crossbar First Author
Device-circuit co-design of memristor based on niobium oxide for large-scale crossbar memoryA. K. Gupta, M. S. Yadav, B. Rawat
Co-designs a niobium-oxide memristor across the device and circuit levels so it can operate inside large-scale crossbar arrays, where device physics and array architecture cannot be treated separately.
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04
RRAM
How Good Silicon Oxide-based Memristor Can be?M. S. Yadav, A. K. Gupta, K. Varshney, B. Rawat
Assesses the realistic ceiling of silicon-oxide-based memristors — how far a CMOS-friendly oxide stack can be pushed as a resistive memory device.
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05
RRAM · Crossbar
Design and modeling of niobium oxide–tantalum oxide based self-selective memristor for large-scale crossbar memoryA. K. Parit, M. S. Yadav, A. K. Gupta, A. Mikhaylov, B. Rawat
Designs and models a self-selective memristor combining niobium oxide and tantalum oxide for large-scale crossbar memory, where selector-less cells are essential.
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06
2D FETs
Performance projection of 2-D material-based CMOS inverters for sub-10-nm channel lengthA. Rawat, A. K. Gupta, B. Rawat
Projects how CMOS inverters built from 2-D materials behave at sub-10-nm channel lengths, benchmarking atomically thin channels as candidates for technology nodes beyond silicon.
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07
RRAM Equal Contribution
Role of Resistive Layer in Threshold Memory Switching Memristor DeviceA. K. Gupta*, M. S. Yadav*, B. Rawat (*equal contribution)
Examines how the resistive layer governs threshold switching in memory-switching memristor devices, informed by electro-thermal modeling of the switching stack.
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08
2D FETs
Single and Multilayer Black Phosphorous-based CMOS Inverter for Deep Sub-10-nm TechnologyA. Rawat, A. K. Gupta, B. Rawat
Explores single- and multilayer black-phosphorus CMOS inverters for deep sub-10-nm technology nodes — an early step into 2-D material device modeling.
Collaboration
This body of work was built with Brajesh Rawat · M. S. Yadav · Akhilesh Rawat · Aditya K. Parit · Alexey Mikhaylov · Kanupriya Varshney.
Full records on Google Scholar · ORCID